Santiago-Morales, J. and Agüera, A. and Gómez-Ramos, M.M. and Fernández-Alba, A.R. and García-Calvo, E. and Rosal, R. (2011) Oxidation by-products and ecotoxicity assessment during the photodegradation of fenofibric acid in aqueous solution with UV and UV/H2O2. Journal of Hazardous Materials, 194. pp. 30-41. ISSN 03043894
Full text not available from this repository.Abstract
The degradation of an aqueous solution of fenofibric acid was investigated using ultraviolet (UV) photolysis and UV/H2O2 with a low-pressure mercury lamp. We obtained quantum yields at different temperatures and the rate constant for the reaction of fenofibric acid with hydroxyl radicals. The maximum radical exposure per fluence ratio obtained was 1.4 × 10−10 M L−1 mW−1. Several reaction intermediates were detected by means of exact mass measurements performed by liquid chromatography coupled to quadrupole-time-of-flight mass spectrometry (LC-ESI-QTOF–MS). UV and UV/H2O2 pathways involve the decarboxylation of fenofibric acid to 4-chloro-4′-(1-hydroxy-1-methylethyl)benzophenone and other minor products, predominantly chlorinated aromatics. We detected several intermediates from reactions with hydroxyl radicals and some lower molecular weight products from the scission of the carbonyl carbon-to-aromatic-carbon bond. We recorded high toxicity in UV irradiated samples for the growth of Pseudokirchneriella subcapitata even after the total depletion of fenofibric acid; this was probably due to the presence of chlorinated aromatics. A degree of toxicity reappeared in highly irradiated UV/H2O2 samples, probably because of the formation of ring-opening products. The degree of mineralization was closely related to that of dechlorination and reached values of over 50% after 3–4 min before stabilizing thereafter.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Fenofibric acid; UV photolysis; UV/H2O2; Toxic by-products; Liquid chromatography; Mass spectrometry |
| Subjects: | T Technology > TD Environmental technology. Sanitary engineering T Technology > TP Chemical technology |
| Depositing User: | José Ángel Gómez Martín |
| Date Deposited: | 30 Apr 2013 14:28 |
| Last Modified: | 30 Apr 2013 14:28 |
| URI: | http://eprints.imdea-agua.org:13000/id/eprint/124 |
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